RESEARCH PROFILE

Adriaan J.M. Mackus is Associate Professor in the Plasma and Materials Processing group within the Applied Physics department at Eindhoven University of Technology (果冻传媒). His research encompasses thin film deposition and etching for applications in nanoelectronics, with a focus on selective processing for bottom-up fabrication.  

ACADEMIC BACKGROUND

Adrie Mackus earned his M.Sc. and Ph.D. degrees (both with highest honors) in Applied Physics from 果冻传媒 in 2009 and 2013, respectively. Adrie worked as a postdoc at the department of Chemical Engineering at Stanford University in 2014-2016. He returned to 果冻传媒 in 2016, where he received tenure in 2019. His current research encompasses atomic layer deposition (ALD) and etching (ALE) for applications in nanoelectronics, with a focus on selective processing for bottom-up fabrication. This involves application-oriented projects funded by industrial partners, as well as fundamental studies of the underlying mechanisms using in-situ techniques. Adrie chaired the 2nd Area Selective Deposition workshop (ASD2017) in Eindhoven in 2017. In 2020 he was awarded a VIDI grant from the Netherlands Organization of Scientific Research (NWO) and a Starting Grant from the European Research Council (ERC).

Key Publications

Prizes & Grants

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